Performance Analysis of FinFET Based Inverter circuit, NAND and NOR Gate at 22nm and 14nm Node technologies
نویسنده
چکیده
The size of integrated devices such as PC, mobiles etc are reducing day by day with multiple operations, all of these is happening because of the scaling down the size of MOSFETs which is the main component in memory, processors and so on. As we scale down the MOSFETs to the nanometer regime the short channel effects arises which degrades the system performance and reliability. Here in this paper we describe the alternative MOSFET called FinFET which reduces the short channel effects and its performance analysis of digital applications such as inverter circuit, nand and nor gates at 22nm and 14nm node technologies. KeywordsFinFET, PTM, Technology node, Power, delay __________________________________________________*****_________________________________________________
منابع مشابه
Robust & Energy Efficient Universal Gates for High Performance Computer Networks at 22nm Process Technology
Digital systems are said to be constructed using basic logic gates. These gates are the NOR, NAND, AND, OR, EXOR & EXNOR gates. This paper presents a robust three transistors (3T) based NAND and NOR gates with precise output logic levels, yet maintaining equivalent performance than the existing logic structures. This new set of 3T logic gates are based on CMOS inverter and Pass Transistor Logic...
متن کاملComparison of the multi-gate functionality of SGrFETs with finFETs
Two-dimensional (2D) technology computer-aided design (TCAD) is used to analyze and compare the multi-gate digital performance of the screen-grid field effect transistor (SGrFET) with a finFET. The switching speed of the all-n-type inverter is ten times faster for the n-SGrFET than for the n-finFET, while the noise margins are ∼400 mV for a 1 V supply for both devices. The performance of the co...
متن کاملEnhanced Circuit Densities in Epitaxially Defined FinFETs (EDFinFETs) over FinFETs
—FinFET technology is prone to suffer from Line Edge Roughness (LER) based VT variation with scaling. To address this, we proposed an Epitaxially Defined (ED) FinFET (EDFinFET) as an alternate to FinFET architecture for 10 nm node and beyond. We showed by statistical simulations that EDFinFET reduces LER based VT variability by 90% and overall variability by 59%. However, EDFinFET consists of w...
متن کاملNovel Reconfigurable Two-MOSFET UV-programmable Floating-Gate Circuits for CARRY’, NAND, NOR or INVERT functions
This article presents two new, reconfigurable multifunction floating-gate circuit to produce either the INVERTED CARRY function for a FULL-ADDER, an INVERTER, or two-input NAND or NOR gates. The circuits contains two MOSFETs and three or four capacitively coupled input signals. SPICE simulations are shown, demonstrating the principal operation, together with preliminary measurements indicating ...
متن کاملChannel thickness dependency of high-k gate dielectric based double-gate CMOS inverter
This work investigates the channel thickness dependency of high-k gate dielectric-based complementary metal-oxide-semiconductor (CMOS) inverter circuit built using a conventional double-gate metal gate oxide semiconductor field-effect transistor (DG-MOSFET). It is espied that the use of high-k dielectric as a gate oxide in n/p DG-MOSFET based CMOS inverter results in a high noise margin as well...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2015